排序方式:

1.Development of a quantitative method for analyzing gas-phase free radicals in mainstream cigarette smoke

Zhou, Jun, Zhu, Yong     More...

Gaodeng Xuexiao Huaxue Xuebao/Chemical Journal of Chinese Universities[0251-0790], Published 2007, Volume 28, Issue 10, Pages 1846-1851

收录情况: WOS SCOPUS CNKI

WOS核心合集引用:  最新影响因子:  0.786    找找相关文章 

2.不锈钢金属丝网上TiO_2纳米薄膜光催化剂的研究

朱永法,李巍,何俣,尚静

高等学校化学学报[0251-0790], Published 2003, Volume 24, Issue 03, Pages 465-468

收录情况: WOS CNKI

WOS核心合集引用:  最新影响因子:  0.786    找找相关文章 

3.BBDMS-PPV/ITO界面结构ADXPS研究

宋伟杰,朱永法,曹立礼,李展平,王道元,     More...

高等学校化学学报[0251-0790], Published 2001, Volume 22, Issue 05, Pages 836-838

收录情况: WOS CNKI

WOS核心合集引用:  最新影响因子:  0.786    找找相关文章 

4.Gd_2CuO_4薄膜与Si SiO_2/Si基底界面相互作用研究

张英侠,朱永法,姚文清,曹立礼

高等学校化学学报[0251-0790], Published 2001, Volume 22, Issue 10, Pages 1703-1706

收录情况: WOS CNKI

WOS核心合集引用:  最新影响因子:  0.786    找找相关文章 

5.Studies on Interface Structure of BBDMS-PPV/ITO System Using ADXPS Technique

Song, Weijie, Zhu, Y     More...

Kao Teng Hsueh Hsiao Hua Heush Hsueh Pao/ Chemical Journal of Chinese Universities[0251-0790], Published 2001, Volume 22, Issue 5, Pages 838

收录情况: SCOPUS

最新影响因子:  0.786    找找相关文章 

6.A Study of the Interface Action between Gd2CuO4 Layer and Si, SiO2/Si Substrate

Zhang, Yingxia, Zhu,     More...

Kao Teng Hsueh Hsiao Hua Heush Hsueh Pao/ Chemical Journal of Chinese Universities[0251-0790], Published 2001, Volume 22, Issue 10, Pages 1706

收录情况: SCOPUS

最新影响因子:  0.786    找找相关文章 

7.金刚石颗粒表面Cr金属化及薄膜间界面扩散反应的研究

朱永法,王莉,姚文清,曹立礼

高等学校化学学报[0251-0790], Published 2000, Volume 21, Issue 08, Pages 1269-1272

收录情况: WOS CNKI

WOS核心合集引用:  最新影响因子:  0.786    找找相关文章 

8.LaCoO_3模型催化剂SO_2中毒机理的研究

朱永法,谭瑞琴,冯杰,嵇世山,曹立礼

高等学校化学学报[0251-0790], Published 2000, Volume 21, Issue 11, Pages 1733-1737

收录情况: WOS CNKI

WOS核心合集引用:  最新影响因子:  0.786    找找相关文章 

9.Studies of SO2 Poisoning Mechanism for Perovskite LaCoO3 Model Catalyst

Zhu, Yongfa, Tan, Ru     More...

Kao Teng Hsueh Hsiao Hua Heush Hsueh Pao/ Chemical Journal of Chinese Universities[0251-0790], Published 2000, Volume 21, Issue 11, Pages 1736-1737

收录情况: SCOPUS

最新影响因子:  0.786    找找相关文章 

10.The Metallization and Interface Reaction between Diamond Particle and Cr Layer

Zhu, Yongfa, Wang, L     More...

Kao Teng Hsueh Hsiao Hua Heush Hsueh Pao/ Chemical Journal of Chinese Universities[0251-0790], Published 2000, Volume 21, Issue 8, Pages 1272

收录情况: SCOPUS

最新影响因子:  0.786    找找相关文章 

条数      条  合计   10   条
    总页 1 
      Go

    本系统需要使用 Internet Explorer 9.0以上 Firefox || Chrome 浏览器

    Copyright © 2015-2021 清华大学图书馆